کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1786355 | 1023413 | 2014 | 5 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Fabrication of multi-scale structures with multiple X-ray masks and synchrotron hard X-ray irradiations Fabrication of multi-scale structures with multiple X-ray masks and synchrotron hard X-ray irradiations](/preview/png/1786355.png)
Synchrotron hard X-ray irradiation can be utilized in lithography processes to manufacture precise structures. Due to the difficulty of precise X-ray mask fabrication in hard X-ray lithography, this X-ray process has been used mainly to fabricate precise microstructures. In this study, a technology is proposed for fabricating novel multi-scale patterns that include submicron-scale structures using hard X-rays. The required X-ray masks for submicron-sized patterning are fabricated by a simple UV lithography process and sidewall metal deposition. Above all, thanks to the high penetration capability of hard X-rays with sub-nanometer wavelengths, it is possible to employ multiple masks to fabricate a variety of patterns. By combining each sub-micron X-ray mask with typical micro-sized X-ray masks, a unique X-ray lithography is performed, and various multi-scale structures are fabricated. The usefulness of the proposed technology is demonstrated by the realization of these structures.
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Journal: Current Applied Physics - Volume 14, Issue 5, May 2014, Pages 833–837