Effects of an Al interlayer on the formation of Pt film on TiO2/Pt/Si structures

We optimized the Al interlayer that was deposited by CVD on UV-exposed TiO2 surfaces and investigated the effect of the Al interlayer on CVD of Pt. TiO2 surfaces irradiated with UV-exposure increased the concentration of hydroxyl groups, which allowed for uniform nucleation and enhanced growth of the Al interlayer. The Al coated TiO2 influenced the CVD of Pt, enhancing the growth rate and the inter-connectivity on Al/TiO2 surfaces. X-ray diffraction patterns revealed the degree of crystallinity of the Al interlayer on UV-exposed TiO2 surfaces and the Pt deposited on Al/UV-exposed TiO2. In addition, a tape test showed enhanced adhesion properties of Pt due to the direct chemical bond formation of Pt and the Al interlayer.