Simple fabrication method of hierarchical nano-pillars using aluminum anodizing processes

A simple fabrication method for the antireflective surface was developed. In conventional methods for antireflective surface, coating method with low refractive index has usually been used. In this paper, we suggested the fabrication method of antireflective surface by the hot embossing process with porous anodized aluminum oxide (AAO). Periodic nano-pore structures were fabricated on a pure aluminum layer. Pore diameter of AAO is about 175 ± 25 nm. In order to replicate antireflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time. Silicon substrate with periodic nano-pore structures (20 mm × 20 mm) were used as a mold stamp of hot embossing process. Finally, antireflective surface can be successfully replicated on PMMA. Nano-pillar arrays were measured by using FE-SEM, AFM and spectrometer. Antireflective structure by replicating hot embossing process can be applied to various displays and automobile components.