Noise analysis and design optimization due to pattern processing in perpendicular patterned media

In patterned media, shape characteristics of dots due to processing fluctuation and resolution will become the main source of the noise. The noise due to the roughness of edge line and roundness by the lithographical resolution was analyzed in this paper. Firstly, edge line roughness was re-created by the method in the semiconductor field, and dot physical pattern was generated. We added the physical pattern roundness due to lithographical resolution varied with the ratio of decreased area by over etching. The result indicated those noise sources caused fatal errors. The processing guidance of the dot was formulated.