Keywords: زبری خط لبه; Epitaxial copper line; Electrical resistivity; Trapezoidal cross-section; Size effect; Line edge roughness; Surface roughness; Surface oxidation; Focused ion beam milling
مقالات ISI زبری خط لبه (ترجمه نشده)
مقالات زیر هنوز به فارسی ترجمه نشده اند.
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در صورتی که به ترجمه آماده هر یک از مقالات زیر نیاز داشته باشید، می توانید سفارش دهید تا مترجمان با تجربه این مجموعه در اسرع وقت آن را برای شما ترجمه نمایند.
Keywords: زبری خط لبه; Resist dissolution; Line edge roughness; In situ analysis; High speed atomic force microscope
Keywords: زبری خط لبه; Metrology; Scanning Electron Microscopy; Critical dimensions; Line edge roughness; Monte Carlo modeling
Keywords: زبری خط لبه; Exposure fluctuation; Line edge roughness; Monte Carlo simulation; Stochastic PSF
Keywords: زبری خط لبه; Electron beam lithography; Molecular dynamics; PMMA; Line edge roughness;
Impact of line edge roughness on the performance of 14-nm FinFET: Device-circuit Co-design
Keywords: زبری خط لبه; FinFET; Line edge roughness; Resist-defined; Spacer-defined; SRAM; Variability;
Line edge roughness induced threshold voltage variability in nano-scale FinFETs
Keywords: زبری خط لبه; FinFET; Line edge roughness; Oxide thickness variation; Random dopant fluctuation; Threshold voltage variability; Work function variation;
Investigation of metal-gate work-function variability in FinFET structures and implications for SRAM cell design
Keywords: زبری خط لبه; FinFET; Line edge roughness; Resist defined; Spacer defined; SRAM; Work function variation;
Sensitivity of secondary electron yields and SEM images to scattering parameters in MC simulations
Keywords: زبری خط لبه; Electron-matter interaction; Monte-Carlo simulation; Secondary electron yield; Scanning electron microscopy; Line edge roughness;
Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data
Keywords: زبری خط لبه; Line edge roughness; Effective medium approximation; Mueller matrix ellipsometry; Optical scatterometry; Nanometrology;
Characterization of Si nanowaveguide line edge roughness and its effect on light transmission
Keywords: زبری خط لبه; Nanowaveguide; Line edge roughness; Optical loss; AFM; SEM
Off-plane diffraction of extreme ultraviolet light caused by line width roughness
Keywords: زبری خط لبه; Line edge roughness; Scatterometry; Extreme ultraviolet
Etching characteristics of silicon oxide using amorphous carbon hard mask in dual-frequency capacitively coupled plasma
Keywords: زبری خط لبه; Silicon dioxide; Dual frequency superimposed capacitively coupled plasma; Amorphous carbon layer; Plasma etching; Line edge roughness
Mesoscale simulation of molecular resists: The effect of PAG distribution homogeneity on LER
Keywords: زبری خط لبه; Molecular resists; Line edge roughness; Mesoscale simulation; Kinetic Monte Carlo; PAG aggregation;
High resolution negative tone molecular resist based on di-functional epoxide polymerization
Keywords: زبری خط لبه; Molecular resists; Line edge roughness; Cationic polymerization; High resolution lithography; Epoxide; E-beam lithography; Extreme ultraviolet lithography
Evaluation of statistical variability in 32 and 22 nm technology generation LSTP MOSFETs
Keywords: زبری خط لبه; Statistical variability; Trapped charge; Thin-body devices; Random discrete dopant; Line edge roughness
Epoxide functionalized molecular resists for high resolution electron-beam lithography
Keywords: زبری خط لبه; Molecular resist; Line edge roughness; High resolution lithography; Epoxide; E-beam lithography
Noise analysis and design optimization due to pattern processing in perpendicular patterned media
Keywords: زبری خط لبه; 43.38.QgPatterned media; Line edge roughness; Lithographical resolution
Improving the sensitivity and line edge roughness in inorganic positive electron beam resist
Keywords: زبری خط لبه; Inorganic resist; Electron beam lithography; Line edge roughness; Photonic crystal; Nano imprint lithography
Roughness reduction in submicron waveguides by low-molecular weight development
Keywords: زبری خط لبه; 47.85.md; 82.35.âx; M 81.07.âb; Roughness reduction; Line edge roughness; Waveguide; Resist development; Molecular aggregates;
Molecular roughness analysis of developed resist by LER method
Keywords: زبری خط لبه; Line edge roughness; Power spectral density method; Molecular aggregate distribution
LER evaluation of molecular resist for EUV lithography
Keywords: زبری خط لبه; Line edge roughness; Molecular resist; EUV lithography
Impact of line-edge roughness on resistance and capacitance of scaled interconnects
Keywords: زبری خط لبه; Interconnect resistance and capacitance; Line edge roughness; Technology scaling
Combined sources of intrinsic parameter fluctuations in sub-25 nm generation UTB-SOI MOSFETs: A statistical simulation study
Keywords: زبری خط لبه; UTB-SOI; MOSFET; Intrinsic parameter fluctuations; Random discrete dopants; Body thickness variation; Line edge roughness
Line edge roughness detection using deep UV light scatterometry
Keywords: زبری خط لبه; Line edge roughness; Line width roughness; Scatterometry; In-line detection
Gate line edge roughness amplitude and frequency variation effects on intra die MOS device characteristics
Keywords: زبری خط لبه; Line edge roughness; Roughness amplitude; Roughness frequency; Roughness wavelength; Lognormal distribution; Thermodynamic-variational model; MOS device; Capacitance; Threshold voltage; TCAD
Determining the impact of statistical fluctuations on resist line edge roughness
Keywords: زبری خط لبه; Electron beam lithography; Line edge roughness; Shot noise;