کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1543134 | 1512838 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Roughness reduction in submicron waveguides by low-molecular weight development
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
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چکیده انگلیسی
Roughness reduction of a submicron waveguide profile in chemically amplified negative resist is here performed by proper selection of an alkali-based developer, taking into account that its smaller molecules lead to smoother resist surface by altering the developing mechanism of aggregate extraction performed with standard quaternary ammonium hydroxide. Roughness is then analyzed by means of classical Atomic Force Microscope inspection; furthermore, a non-invasive line edge roughness analysis approach based on top-down scanning electron microscope acquisition gives comparable results, in terms of standard deviation and molecular aggregate periodicity.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Photonics and Nanostructures - Fundamentals and Applications - Volume 5, Issues 2â3, October 2007, Pages 145-148
Journal: Photonics and Nanostructures - Fundamentals and Applications - Volume 5, Issues 2â3, October 2007, Pages 145-148
نویسندگان
M.C. Ubaldi, V. Stasi, U. Colombo, D. Piccinin, M. Martinelli,