کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5348576 | 1388083 | 2016 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Mueller matrix ellipsometry (MME) is applied to characterize lithographic patterns with natural line edge roughness (LER). A computationally efficient approach based on effective medium approximation is proposed to model the effects of LER in MME measurements. We present both the theoretical and experimental results on lithographic patterns with realistic LER which demonstrate that MME in combination with the proposed effective modeling method is capable of quantifying LER amplitudes. Quantitative comparisons between the MME and scanning electron microscopy measured results also reveal the strong potential of this technique for in-line nondestructive line roughness monitoring.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 388, Part A, 1 December 2016, Pages 524-530
Journal: Applied Surface Science - Volume 388, Part A, 1 December 2016, Pages 524-530
نویسندگان
Xiuguo Chen, Yating Shi, Hao Jiang, Chuanwei Zhang, Shiyuan Liu,