کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7941009 | 1513198 | 2017 | 17 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Line edge roughness induced threshold voltage variability in nano-scale FinFETs
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
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چکیده انگلیسی
In aggressively scaled devices, the FinFET technology has become more prone to line edge roughness (LER) induced threshold voltage variability. As a result, nano scale FinFET structures face the problem of intrinsic statistical fluctuations in the threshold voltage. This paper describes the all LER induced variability of threshold voltage for 14Â nm underlap FinFET using 3-D numerical simulations. It is concluded that percentage threshold voltage (VTH) fluctuations referenced with respect to rectangular FinFET can go up to 8.76%. This work has also investigated the impact of other sources of variability such as random dopant fluctuation, work function variation and oxide thickness variation on threshold voltage.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Superlattices and Microstructures - Volume 103, March 2017, Pages 304-313
Journal: Superlattices and Microstructures - Volume 103, March 2017, Pages 304-313
نویسندگان
Rituraj Singh Rathore, Rajneesh Sharma, Ashwani K. Rana,