کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1803767 | 1024629 | 2008 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Electrodeposited Co–Cu/Cu multilayered microposts
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موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
X-ray lithography and electrodeposition were combined to deposit an array of Co–Cu/Cu multilayer microposts of 500 μm tall into deep recesses for novel giant magnetoresistance (GMR) architectures. A citrate-boric acid electrolyte was used with pulsed potential. The applied potential was determined through inspection of the polarization curve from linear sweep voltammetry, and scanning electron microscopy (SEM)/transmission electron microscope (TEM) confirmed the micropost layered structure. Room temperature magnetoresistance was reported for different bilayer sizes of the micropost, and up to 4% current perpendicular-to-plane giant magnetoresistance (CPP-GMR) with saturation values less than 1 T was observed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Magnetism and Magnetic Materials - Volume 320, Issue 23, December 2008, Pages 3282–3287
Journal: Journal of Magnetism and Magnetic Materials - Volume 320, Issue 23, December 2008, Pages 3282–3287
نویسندگان
Y. Li, M. Moldovan, D.P. Young, E.J. Podlaha,