کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
180928 | 459392 | 2010 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Electrochemical deposition of sulfur doped DLC nanocomposite film at atmospheric pressure
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
مهندسی شیمی (عمومی)
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چکیده انگلیسی
Sulfur doped DLC nanocomposite film was fabricated on n-type silicon substrates by the electrochemical method using the mixture of methanol and thiofuran as the precursor. The synthesis and microstructure of the composite film was investigated. Compared with pure carbon film, sulfur doping effectively enhanced carbon film graphitization, and reduced the surface roughness, confirmed by XPS, Raman and AFM. In particular, XPS analysis revealed sulfur atoms among amorphous carbon matrix was in the form of organosulfur compounds. Furthermore, a novel but feasible growth mechanism was proposed following the synergism of thermochemistry, plasma chemistry and electrochemistry processes.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochemistry Communications - Volume 12, Issue 1, January 2010, Pages 61–65
Journal: Electrochemistry Communications - Volume 12, Issue 1, January 2010, Pages 61–65
نویسندگان
Shanhong Wan, Liping Wang, Qunji Xue,