Highly oriented polycrystalline α-HgI2 films grown through combined vertical deposition and HWPVD methods

Different α-HgI2 seed layers were prepared by vertical deposition method through varying reactive solution concentrations. Polycrystalline α-HgI2 films were grown on the α-HgI2 seed layer by the hot wall vapor phase deposition (HWPVD) method. The orientation along the (001) direction and compactness of the polycrystalline α-HgI2 films are significantly enhanced as compared to that without a seed layer. The polycrystalline α-HgI2 films grown on a three-deposit seed layer show improved electrical properties.