کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1826635 1526472 2010 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
High-reflectivity (m=4) elliptical neutron focusing supermirror fabricated by numerically controlled local wet etching with ion beam sputter deposition
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم ابزار دقیق
پیش نمایش صفحه اول مقاله
High-reflectivity (m=4) elliptical neutron focusing supermirror fabricated by numerically controlled local wet etching with ion beam sputter deposition
چکیده انگلیسی

High-performance neutron-focusing supermirror devices with both high figure accuracy and high reflectivity are essential to effectively collect and focus a neutron beam on a sample without scattering loss. To fabricate these devices, numerically controlled local wet etching and ion beam sputter deposition techniques were developed for the figuring of an aspherical mirror substrate and for the deposition of NiC/Ti multilayers, respectively. By applying these techniques, a plano-elliptical supermirror with a clear aperture size of 90 mm×40 mm was fabricated to focus a cold neutron beam. Focusing performance and reflectivity were evaluated using a neutron reflectometer and a focusing gain of 4.4 and a reflectivity of 0.64–0.7 in the near-critical-angle region for m=4 were achieved.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment - Volume 616, Issues 2–3, 1 May 2010, Pages 193–196
نویسندگان
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