کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1826653 1526472 2010 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Fabrication of damage-free Johansson-type doubly curved crystal spectrometer substrate by numerically controlled local wet etching
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم ابزار دقیق
پیش نمایش صفحه اول مقاله
Fabrication of damage-free Johansson-type doubly curved crystal spectrometer substrate by numerically controlled local wet etching
چکیده انگلیسی

A doubly curved crystal spectrometer with Johansson-type geometry is very effective for focusing and monochromatizing an X-ray beam. In this study, numerically controlled local wet etching (NC-LWE) was used to form the curvature of the Si(1 1 1) substrate. NC-LWE figuring reduced the inclination of the crystal plane to less than 0.01° by applying the controlled etching of the surface, and achieved error of the figured curvature radius R of 6.7%. The reflectivity and the full width at half maximum (FWHM) of the rocking curve of the processed surface were almost the same as those of the unprocessed surface.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment - Volume 616, Issues 2–3, 1 May 2010, Pages 281–284
نویسندگان
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