Preparation of self-supporting targets with thickness <100 μg/cm2

Preparation techniques are described for self-supporting targets with thickness of less than 100 μg/cm2 by means of vacuum evaporation and focused heavy-ion beam sputtering. With a visible light photo spectrometer optical transmittance as a function of thickness was calibrated for several metal films of different elements. These data were used for thickness determination of self-supporting targets of those materials.