کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1831691 1027502 2007 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Behavior of 220Rn progeny in diffusion chamber
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم ابزار دقیق
پیش نمایش صفحه اول مقاله
Behavior of 220Rn progeny in diffusion chamber
چکیده انگلیسی
The distribution of 220Rn (thoron) within the cylindrical diffusion chamber decreases exponentially with the distance from the entry filter. The first 220Rn progeny 216Po follows its parent due to its very short half life. Other 220Rn progeny are almost completely deposited, but the deposition is not uniform. Deposition occurs on all internal surfaces of cylinder including vertical wall as well as its bases. Deposition on the upper and lower base is enhanced in the middle and drops toward to the end while the deposition on “vertical” wall is larger closer to the entry membrane.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment - Volume 570, Issue 1, 1 January 2007, Pages 182-186
نویسندگان
, ,