Effect of Spatial Image Transfer in a Pulse МОCVD Process

The deposition of HfO2 and MgO layers from Hf(thd)4 and Mg(thd)2 by Pulse MOCVD technique with discrete reagents dosage in slit systems with uniform and nonuniform susbtrqate materials is considered. The obtained layers were studied by menas of scanning ellipsometry. The effect of the three-dimensional image transfer in the slit structure from one substrate to the opposite one in hte form of a relief nanometer-sized film was discovered. This effect may be used for non- lithographic formation of film structures.