Enhanced solvent resistance of acrylonitrile–butadiene rubber by electron beam irradiation

In this study, we investigated the effect of electron beam irradiation on NBR (acrylonitrile–butadiene rubber) with TMPTMA (trimethylolpropane trimethacrylate), focusing on the polar and non-polar solvent resistance at different electron beam radiation doses. The electron beam irradiation on NBR containing TMPTMA sheets was performed over a range of absorbed doses from 20 to 200 kGy to make three-dimensional network structures. The solvent resistance was characterized according to ASTM D 471 in benzene and THF solvent. The solvent resistance of NBR was enhanced by the addition of TMPTMA in a dose-dependent manner. In addition, the volume change of immersed NBR in THF solvent was slightly lower than in benzene solvent.