Accurate measurement of the steady-state swelling behavior of SU-8 negative photo resist

The swelling behaviour of SU-8 2000 series is investigated. This is done using on-wafer micro machined stress indicator structures. The indicator structures convert the stress in the material to a measurable displacement. When SU-8 is submersed into a solvent, the polymer matrix of the SU-8 can absorb some of the solvent molecules. As a result, the SU-8 can expand and the built in tensile stress is partially relieved. The swelling can thus be measured directly and independently of lithography parameters. For this study, the indicator structures are immersed in Propyle Glycol Methyl Ether Acetate (PGMEA), isopropyl alcohol (IPA) and water.