کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
41209 | 45880 | 2011 | 8 صفحه PDF | دانلود رایگان |

The photocatalytic decomposition of toluene gas was investigated using TiO2 prepared by atomic layer deposition (ALD) on nanodiamond (ND) under UV irradiation. The photocatalytic activities of ND-supported TiO2 catalysts were compared with that of P-25. The photocatalytic activity of P-25 was rapidly decreased with time due to the accumulation of reaction intermediates formed on the surface as a result of partial oxidation of toluene. Comparing to P-25, deactivation of ND-supported TiO2 catalysts was less pronounced. It is suggested that ND surface facilitates total oxidation of toluene on TiO2 and reduces poisoning of TiO2 surface with time.
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► TiO2 was deposited on nanodiamonds using atomic layer deposition.
► Photocatalytic decomposition of toluene was studied.
► TiO2/nanodiamonds are more tolerant towards deactivation than P-25 TiO2.
Journal: Applied Catalysis A: General - Volume 408, Issues 1–2, 28 November 2011, Pages 148–155