کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5026065 | 1470591 | 2017 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Numerical simulation of thermal stress damage in 1064Â nm anti-reflection fused silica by millisecond pulsed laser
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Numerical simulation of thermal stress damage in 1064Â nm anti-reflection fused silica by millisecond pulsed laser Numerical simulation of thermal stress damage in 1064Â nm anti-reflection fused silica by millisecond pulsed laser](/preview/png/5026065.png)
چکیده انگلیسی
In this paper, we study and establish the theoretical model of thermal stress damage of 1064Â nm anti-reflection fused silica, based on which transient distributions of temperature field and thermal stress field are simulated using the finite element method (FEM) and then analyze the mechanism of the damage. The main results show that: there is a cumulative effect in the process of 1064Â nm anti-reflection fused silica damaged by the laser, its effect is to make the material damage degree increased. The radial temperature gradient is bigger and the axial temperature gradient is smaller in the fused silica internal. In thermal stress damage process which circumferential stress acts a primary role, 1064Â nm anti-reflection fused silica damaged by the laser often occurs at the action center or the edge near the spot radius.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optik - International Journal for Light and Electron Optics - Volume 136, May 2017, Pages 144-150
Journal: Optik - International Journal for Light and Electron Optics - Volume 136, May 2017, Pages 144-150
نویسندگان
J.X. Cai, M. Guo, G.Y. Jin,