Use of gas cluster ion source depth profiling to study the oxidation of fullerene thin films by XPS

Use of gas cluster ion source depth profiling to study the oxidation of fullerene thin films by XPS

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Organic Electronics - Volume 49, October 2017, Pages 85-93

James D. McGettrick, Emily Speller, Zhe Li, Wing C. Tsoi, James R. Durrant, Trystan Watson,