The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films

The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 419, 15 October 2017, Pages 795-801

Mengying Wang, Yohann Thimont, Lionel Presmanes, Xungang Diao, Antoine Barnabé,