Oxygen accumulation on metal surfaces investigated by XPS, AES and LEIS, an issue for sputter depth profiling under UHV conditions

Oxygen accumulation on metal surfaces investigated by XPS, AES and LEIS, an issue for sputter depth profiling under UHV conditions

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 411, 31 July 2017, Pages 189-196

R. Steinberger, C.E. Celedón, B. Bruckner, D. Roth, J. Duchoslav, M. Arndt, P. Kürnsteiner, T. Steck, J. Faderl, C.K. Riener, G. Angeli, P. Bauer, D. Stifter,