Depth-prediction method for direct laser-scribing processes

In this paper we introduce a method for predicting the ablation depth in direct laser-scribing processes based on laser-processing parameters and convenient properties like the ablation threshold fluence and the laser penetration depth. In order to apply this method though, the materials must comply with two conditions: a) the material does not develop incubation with successive pulses and b) the ablation depth obtained at any position by a single pulse is determined by the fluence reaching that point. We present experimental data using nanosecond sources and a wavelength of 355 nm for TCOs Indium doped Tin Oxide and Aluminum doped Zinc Oxide that endorse the proposed method as a tool for predicting the ablated depth in laser scribes.