Optimizing the combination of MoO3 interface layer and low pressure plasma treatment on indium tin oxide (ITO) anode

Optimizing the combination of MoO3 interface layer and low pressure plasma treatment on indium tin oxide (ITO) anode

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 422, 15 November 2017, Pages 207-215

Yunlong Jiang, Yingjie Cui, Xi Cui, Yu Zhang, Liang Zhou, Yi Feng, Tieqiang Zhang,