Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition

- The formation of pure and stoichiometric MoS2 thin film by atomic layer deposition (ALD).
- ALD of MoS2 using Mo(CO)6 and H2S plasma.
- Large-area (4 in. in diameter) and direct growth of MoS2 thin films and nanosheets by ALD.
- Remarkable step coverage at 100 nm trench.