کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5348119 | 1503574 | 2017 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies](/preview/png/5348119.png)
چکیده انگلیسی
In this paper we show a comparison of chosen lithographies used for the AZ 5214E photoresist, which is normally UV sensitive but has also been investigated for its sensitivity to e-beam exposure. Three lithographies, the E-Beam Direct Write lithography (EBDW), laser Interference Lithography (IL) and the non-contact Near-field Scanning Optical Microscopy (NSOM) lithography, are discussed here and the results on exposed arrays of simple patterns are shown. With the EBDW and IL we achieved periods of the structures around half-micron, and we demonstrate attainability of dimensions smaller or comparable than usually achieved by a standard optical photolithography with the investigated photoresist. With the non-contact NSOM lithography structures with periods slightly above a micron were achieved.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 395, 15 February 2017, Pages 226-231
Journal: Applied Surface Science - Volume 395, 15 February 2017, Pages 226-231
نویسندگان
J. Å kriniarová, D. PudiÅ¡, R. Andok, I. Lettrichová, F. Uherek,