Cu and Cu(Mn) films deposited layer-by-layer via surface-limited redox replacement and underpotential deposition

Cu and Cu(Mn) films deposited layer-by-layer via surface-limited redox replacement and underpotential deposition

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 364, 28 February 2016, Pages 358-364

J.S. Fang, S.L. Sun, Y.L. Cheng, G.S. Chen, T.S. Chin,