کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5348419 | 1388079 | 2015 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Investigated performance of uncooled tantalum-doped VOx floating-type microbolometers
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Various tantalum (Ta)-doped vanadium oxide (VOx:Ta) films with various Ta doping contents were deposited on the Si substrates as the sensitive layer of the floating-type microbolometers using a magnetron radio frequency (RF) co-sputtering system. The vanadium (V) target and the tantalum pentoxide (Ta2O5) target were used to deposit the VOx:Ta films. To improve the microbolometer responsivity by effectively reducing the thermal loss from the Si substrates, the floating-type microbolometers were fabricated using bulk micromachining technique. From the X-ray photoelectron spectroscopy (XPS) spectra, except the V2O5 and V6O13, the lower oxygen state of VOx films, such as VO2 and V2O3, were also obtained by doping Ta into the VOx films. Consequently, compared with the VO2 microbolometers, the VOx:Ta microbolometers could operate at a higher operating temperature range. The temperature coefficient of resistance (TCR) and the resistivity of the VOx:Ta (Ta content of 7.63%) films measured by four point probe measurement in heating system were â3.47%/K and 9.32 Ω-cm, respectively. The Ta-doped VOx microbolometer revealed a higher responsivity of 341 kV/W compared with 106 kV/W of the undoped VOx microbolometer.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 354, Part A, 1 November 2015, Pages 106-109
Journal: Applied Surface Science - Volume 354, Part A, 1 November 2015, Pages 106-109
نویسندگان
Hsin-Ying Lee, Chia-Ling Wu, Ching-Hua Kao, Ching-Ting Lee, Shiang-Feng Tang, Wen-Jen Lin, Hsin-Chang Chen, Jia-Ching Lin,