کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5349877 | 1503652 | 2014 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Patterning of Tl-based superconducting films using new etching solution
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Patterning of Tl-based superconducting films using new etching solution Patterning of Tl-based superconducting films using new etching solution](/preview/png/5349877.png)
چکیده انگلیسی
Tl-based cuprate superconducting films were prepared in a two-step process by RF magnetron sputtering of an amorphous precursor and ex situ thallination in open system. The films prepared on LaAlO3 and CeO2 buffered R-plane sapphire substrates consisted from c-axis oriented Tl-2212 superconducting phase. The zero resistance critical temperature TC0 exhibited values up to 94Â K. Subsequently, superconducting structures were prepared from the Tl-based thin films using photolithography process and wet etching. A new etchant based on potassium iodide was used for the Tl-based film patterning. The prepared structures had sharp edges, unchanged phase composition and critical temperature values. Such a way of the Tl-based film patterning is very simple, fast and easy to realize.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 312, 1 September 2014, Pages 208-211
Journal: Applied Surface Science - Volume 312, 1 September 2014, Pages 208-211
نویسندگان
M. Sojková, V. Å trbÃk, M. Å panková, Å . Chromik,