کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5351303 | 1388133 | 2017 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The effect of different annealing temperatures on the structure and luminescence properties of Y2O3:Bi3+ thin film fabricated by RF magnetron sputtering
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Y2O3:Bi3+ thin films have been fabricated onto Si substrates by the radio frequency magnetron sputtering technique. The influence of different annealing temperature was studied by X-ray diffraction(XRD), Atomic force microscopy, scanning electron microscopy and Photoluminescence (PL). The XRD study revealed that, the Y2O3:Bi3+ thin films have a cubic phase but the orientation of these films changed with the increase of the annealing temperature. Evolution of the texture coefficient on the film texture had been calculated.The morphological studies showed that the as-prepared film was smooth and uniform but the annealed films showedislands like growth atdifferent placeson the thin films. Intense blue emission was observed from the as-prepared film using a 325Â nm He-Cd laser as excitation source. A variation of the PL peak positions as a function of annealing temperature was observed. These results suggest that the increase in annealing temperature hasaffected the thin film's crystal orientation as well as the luminescence properties of these thin films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 424, Part 3, 1 December 2017, Pages 407-411
Journal: Applied Surface Science - Volume 424, Part 3, 1 December 2017, Pages 407-411
نویسندگان
A. Yousif, Vinod Kumar, R.M. Jafer, H.C. Swart,