کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5351448 | 1503562 | 2017 | 15 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Influence of metallic surface states on electron affinity of epitaxial AlN films
ترجمه فارسی عنوان
تأثیر سطوح سطح فلز روی جذب الکترونها از فیلمهای آلومینیوم اپیتاکسیال
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
چکیده انگلیسی
The present article investigates surface metallic states induced alteration in the electron affinity of epitaxial AlN films. AlN films grown by plasma-assisted molecular beam epitaxy system with (30% and 16%) and without metallic aluminium on the surface were probed via photoemission spectroscopic measurements. An in-depth analysis exploring the influence of metallic aluminium and native oxide on the electronic structure of the films is performed. It was observed that the metallic states pinned the Fermi Level (FL) near valence band edge and lead to the reduction of electron affinity (EA). These metallic states initiated charge transfer and induced changes in surface and interface dipoles strength. Therefore, the EA of the films varied between 0.6-1.0Â eV due to the variation in contribution of metallic states and native oxide. However, the surface barrier height (SBH) increased (4.2-3.5Â eV) adversely due to the availability of donor-like surface states in metallic aluminium rich films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 407, 15 June 2017, Pages 255-259
Journal: Applied Surface Science - Volume 407, 15 June 2017, Pages 255-259
نویسندگان
Monu Mishra, Shibin Krishna, Neha Aggarwal, Govind Gupta,