Atomic emission stratigraphy by laser-induced plasma spectroscopy: Quantitative depth profiling of metal thin film systems

Laser-induced plasma spectroscopy (LIPS) with a frequency-quadrupled Nd:YAG laser (266 nm, pulse duration: 4 ns) was applied to a metallic layer system consisting of an electrodeposited copper layer (30 μm) on an aluminium substrate. A stratigraphic model describing the emission signal in dependence of the pulse number was developed, which can explain several effects originating from laser ablation of various thin top layers by means of the Gaussian beam cross section character. This model was applied to trace elements through layers with thicknesses that are in the range of the resolvable depth, given by the single-pulse ablation rate, by means of empirical fitting functions. Additionally, the contribution of redeposited bulk material to the characteristic shape of emission-traces when averaging spot arrays with varying spacing could be quantified. This can be used to estimate cross-contamination in analytical applications where ablations need to be performed at close spacing.