Pulse laser machining and particulate separation from high impact polystyrene

Opaque high impact polystyrene (HIPS) contaminated with graphite particles and poly(styrene-co-divinyl benzene) spheres can only be removed efficiently with nanosecond-pulsed laser radiation of 532 nm while the substrate is preserved. The destruction thresholds are 1-2 orders of magnitude lower than that of other common technical polymers. The inhomogeneously distributed polybutadiene composite component led to enhanced light scattering in the polystyrene matrix so that increased light absorption and energy density causes a comparatively low ablation threshold. Due to this fact there is advantageous potential for pulse laser machining at comparatively low fluences.