A study of the initial film growth of PEG-like plasma polymer films via XPS and NEXAFS

- Substrate-plasma polymer film interfaces were exposed allowing the underside of the films to be examined and compared with the top side.
- Both sides of the plasma polymer films were examined using X-ray photoelectron spectroscopy (XPS) and near edge X-ray absorption fine structure (NEXAFS) spectroscopy.
- High input power during polymerization produced plasma polymer films with chemical gradients, which contain more ether units at the initial formation stage compared with the top layer.
- Film chemistry was dependent on the type of substrate used for the plasma polymerization deposition.