کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5352051 | 1503565 | 2017 | 10 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Reduction of secondary electron yield for E-cloud mitigation by laser ablation surface engineering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Reduction of secondary electron yield for E-cloud mitigation by laser ablation surface engineering Reduction of secondary electron yield for E-cloud mitigation by laser ablation surface engineering](/preview/png/5352051.png)
چکیده انگلیسی
Developing a surface with low Secondary Electron Yield (SEY) is one of the main ways of mitigating electron cloud and beam-induced electron multipacting in high-energy charged particle accelerators. In our previous publications, a low SEY < 0.9 for as-received metal surfaces modified by a nanosecond pulsed laser was reported. In this paper, the SEY of laser-treated blackened copper has been investigated as a function of different laser irradiation parameters. We explore and study the influence of micro- and nano-structures induced by laser surface treatment in air of copper samples as a function of various laser irradiation parameters such as peak power, laser wavelength (λ = 355 nm and 1064 nm), number of pulses per point (scan speed and repetition rate) and fluence, on the SEY. The surface chemical composition was determined by x-ray photoelectron spectroscopy (XPS) which revealed that heating resulted in diffusion of oxygen into the bulk and induced the transformation of CuO to sub-stoichiometric oxide. The surface topography was examined with high resolution scanning electron microscopy (HRSEM) which showed that the laser-treated surfaces are dominated by microstructure grooves and nanostructure features.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 404, 15 May 2017, Pages 370-379
Journal: Applied Surface Science - Volume 404, 15 May 2017, Pages 370-379
نویسندگان
R. Valizadeh, O.B. Malyshev, S. Wang, T. Sian, M.D. Cropper, N. Sykes,