Effect of nitrogen surrounding gas and plasma assistance on nitrogen incorporation in a-C:N films by femtosecond pulsed laser deposition

- Plasma plume analysis is correlated to N contents in a-C:N films.
- DC-bias assisted femtosecond-PLD Carbon is found to have a detrimental or enhancing effect on the N contents of carbon nitride films.
- At low pressure, DC bias assistance induces a reduction of CN contents in the plume and then lower N contents in the film.
- A plasma assistance under 10 Pa pressure is sufficient to trigger a strong CN creation reaction, enhancing N contents of a-C:N thin films from 16 to 25% at 10 Pa.