کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5353522 | 1503689 | 2013 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Molecular dynamic simulation of binary ZrxCu100âx metallic glass thin film growth
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
In this work, we employed classical molecular dynamics simulations model to study ZrxCu100âx (3 â¤Â x â¤Â 95) metallic glass films deposited on a silicon (1 0 0) substrate. Input data were chosen to fit with the experimental operating conditions of a magnetron sputtering deposition system. The growth evolution is monitored with variable compositions of the incoming atom vapor. The Zr-Zr, Cu-Cu and Zr-Cu interactions are modeled with the Embedded Atom Method (EAM), the Si-Si interaction with Tersoff potential, the Zr-Si and Cu-Si interactions with Lennard-Jones (12-6) potential. Different film morphology and structure were detected and analyzed when the Zr to Cu ratio is varied. The results are compared with X-ray diffraction and scanning electron microscopy analyses of experimentally deposited thin films by magnetron sputter deposition process. Both simulation and experiment results show that the structure of the ZrxCu100âx film varies from crystalline to amorphous depending on the elemental composition.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 274, 1 June 2013, Pages 164-170
Journal: Applied Surface Science - Volume 274, 1 June 2013, Pages 164-170
نویسندگان
Lu Xie, Pascal Brault, Anne-Lise Thomann, Larbi Bedra,