Preparation of the photosensitive copper complex and CuO film pattern

The precursor solution was prepared with copper acetate (Cu(OAc)2) as the start material, acrylic acid (AA) as the chemical modifier, and absolute methanol (MEOH) as the solvent. AA reacted with Cu(OAc)2 to form the copper complex with the photosensitivity. In the complex, Cu ion is coordinated with two hydroxy oxygen atoms of AA. The coated gel film using this precursor solution exhibited photosensitivity to UV light at around 245 nm. Based on the photosensitivity, the patterned CuO film was fabricated.