The study of optimal oxidation time and different temperatures for high quality VO2 thin film based on the sputtering oxidation coupling method

► The VO2 thin film was deposited by a novel sputtering oxidation coupling method. ► The relationship between oxidation time and temperature 1/T is in agreement with Wagner's model. ► The oxidation time as a function temperature 1/T presents a linear relationship among 703 K-783 K.