In situ stress measurements during pulsed laser deposition of BaTiO3 and SrTiO3 atomic layers on Pt(0Â 0Â 1)

We identify that in addition to misfit also the oxygen partial pressure during PLD film growth influences film stress. PLD growth in an oxygen-free environment leads to factor of two increased tensile stress in SrTiO3 on Pt(0 0 1) as compared to growth at pO2=10−4 mbar. The role of film stoichiometry for film stress is discussed.