Study of plasma immersion ion implantation into silicon substrate using magnetic mirror geometry

► Plasma density increases in magnetic bottle configuration due to magnetized electrons drifting in crossed E × B fields, promoting electronneutral collision and as a result, the ion current density increases. ► Plasma immersion ion implantation in crossed E × B fields provides significant changes in surface properties of the samples. ► The plasma immersion ion implantation process with magnetic field has increased the dose and the depth of implantation by a factor of 1.5 in the case of sample implanted at high energy.