Fabrication of sub-micrometric metallic hollow-core structures by laser interference lithography

► Arrays of hollow-core sub-micrometric structures are fabricated. ► Laser interference lithography is used for the pattering of the resist sacrificial layer. ► The removal of the sacrificial layer gives rise to metallic channels with a maximum crosssectional area of 0.1 μm2. ► These structures can be used in nanofluidics.