Reliability assessment of ultra-thin HfO2 films deposited on silicon wafer

► Nano-mechanical properties on annealed ultra-thin HfO2 film are studied. ► By AFM analysis, hardness of the crystallized HfO2 film significantly increases. ► By nano-indention, the film hardness increases with less contact stiffness. ► Quality assessment on the annealed ultra-thin films can thus be achieved.