Influence of pulsed substrate bias on the structure and properties of Ti-Al-N films deposited by cathodic vacuum arc

► It showed that the films exhibited NaCl-type fcc structure. With the increase substrate bias the microstructure of the films changed from random orientation to (1 0 0) and (2 2 0) texture. ► The Ti/(Ti + Al) atomic ratio gradually increased from 43% to 52% with an increase of bias voltage. ► The nanohardness, friction coefficient and Lc approach highest values of 39 GPa, 0.36 and 75 N respectively. ► It was found that ideal mechanical properties of films can be obtained with medium substrate bias voltage.