Transparent conductive p-type lithium-doped nickel oxide thin films deposited by pulsed plasma deposition

► Transparent p-type Li0.25Ni0.75O conductive films were prepared by pulsed plasma deposition. ► The influences of substrate temperature and oxygen pressure on properties of films were investigated. ► The electrical and optical properties were discussed detailedly and explained possibly. ► The hetero-junction diode p-NiO:Li/n-SnO2:W exhibits rectifying I-V characteristics.