Growth of graphene-like thin films at low temperature by dual-frequency capacitively coupled plasma

► We developed a new method of growing graphene-like thin films on glass substrates. ► Dual-frequency capacitively coupled plasma (DF-CCP) enhanced chemical vapor deposition (CVD) was used as the film growing method. ► Graphene-like films were grown at low temperature without using any metallic catalyst. ► The defects of films could be decreased and the crystal structure could be improved effectively by annealing treatment.