Characterization of indium tin oxide films by RF-assisted DC magnetron sputtering

► A high quality of ITO film deposited on PET substrate at room temperature was achieved by a commercial RF-assisted DC magnetron sputter. ► A moderate sputtering rate and denser microstructure of ITO films can be achieved by this unique sputter. ► The electrical resistivity was obtained a minimum value of 5.3 × 10−4 Ω cm by wisely adjusting to a 50% RF portion of the total power. ► The electrical resistivity and optical transmission of ITO films were further improved to 3.9 × 10−4 Ω cm and 90% by flowing 2 sccm of O2 gas. ► This research dominates the feasibility of in-line mass production of ITO-coated PET films at room temperature for OLED and touch panel applications.