کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5357565 | 1503637 | 2015 | 38 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structure, mechanical and tribological properties of HfCx films deposited by reactive magnetron sputtering
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
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چکیده انگلیسی
Hafnium carbide (HfC) films have been deposited on Si (1Â 0Â 0) substrates by direct current reactive magnetron sputtering. The microstructure, compressive stress, hardness and tribological behaviors show great dependence on carbon (C) concentration and chemical bonding state. With C content in HfCx films rising, phase transforms from hexagonal-close-packed (HCP) Hf(C) to face-centered-cubic (FCC) HfC, and nanocomposite structure consisting of HfCx nanocrystalline grains encapsulated by amorphous carbon (a-C) matrix forms at moderate C content. The hardness of HfCx films increases significantly from 10.4Â GPa (14Â at.% C) to 34.4Â GPa (58Â at.% C) and then keeps dropping with further increasing C content. a-C appears in HfCx films with more than 32Â at.% C and it obviously lowers coefficient of friction (COF). The wear resistance can be remarkably worsened by high compressive stress. The film with 76Â at.% C exhibits relatively high hardness and low compressive stress, good fracture toughness and self-lubrication transfer layer, showing great combination of the lowest COF of 0.10 and lowest wear rate of 1.10Â ÃÂ 10â6Â mm3/Nm.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 327, 1 February 2015, Pages 68-76
Journal: Applied Surface Science - Volume 327, 1 February 2015, Pages 68-76
نویسندگان
Wang Shuo, Zhang Kan, An Tao, Hu Chaoquan, Meng Qingnan, Ma Yuanzhi, Wen Mao, Zheng Weitao,