کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5358351 | 1503650 | 2014 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
High precision patterning of ITO using femtosecond laser annealing process
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: High precision patterning of ITO using femtosecond laser annealing process High precision patterning of ITO using femtosecond laser annealing process](/preview/png/5358351.png)
چکیده انگلیسی
High precision patterning of crystalline indium tin oxide (c-ITO) patterns on amorphous ITO (a-ITO) thin films by femtosecond laser-induced crystallization with a Gaussian beam profile followed by chemical etching is demonstrated. In the proposed approach, the a-ITO thin film is selectively transformed into a c-ITO structure via a low heat affect zone and the well-defined thresholds (ablation and crystallization) supplied by the femtosecond laser pulse. The experimental results show that by careful control of the laser fluence above the crystallization threshold, c-ITO patterns with controllable line widths and ridge-free characteristics can be accomplished. By careful control of the laser fluence above the ablation threshold, fast fabrication of the two parallel sub-micro c-ITO line patterns using a single femtosecond laser beam and single scanning path can be achieved. Along-length sub-micro c-ITO line pattern is fabricated, and the feasibility of fabricating c-ITO patterns is confirmed, which are expected to be used in micro-electronics devices.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 314, 30 September 2014, Pages 215-220
Journal: Applied Surface Science - Volume 314, 30 September 2014, Pages 215-220
نویسندگان
Chung-Wei Cheng, Cen-Ying Lin,